VLSI Mid-Term — Complete Formula Sheet
Every formula from the guide, one page. Faculty notation (subscript n/p).
1 · Pass Characteristics
NMOS: Vout = Min[Vin, VG − VTn]
PMOS: Vout = Max[VG + |VTp|, Vin]nFET → strong-0, weak-1 (VDD−VTn). pFET → strong-1, weak-0 (|VTp|).
2 · CMOS Logic Design
#transistors = #literals(f′)
PDN(NMOS): AND→series, OR→parallel
PUN(PMOS) = dual of PDN
2:1 MUX (TG): F = P0·s′ + P1·sTransmission gate = nFET‖pFET, no threshold loss.
3 · Interconnect RC / Layout
R = ρl/A
Rs = ρ/t [Ω/sq]
R_line = Rs·n , n = l/wCorner square = 0.635 × normal square.
C_line = εox·w·l / Tox
τ = R_line·C_line
v(t) = Vs(1 − e^(−t/τ))εox=3.9ε0, ε0=8.854×10⁻¹⁴ F/cm
4 · MOSFET Physics & Current
Cox = εox / tox
k'n = μn·Cox, βn = k'n(W/L)
Triode: ID = k'n(W/L)[(VGSn−VTn)VDSn − VDSn²/2]
Saturation: ID = (βn/2)(VGSn−VTn)²
VDSn,sat = VGSn − VTn
w/ channel-length mod:
ID = (βn/2)(VGSn−VTn)²[1+λ(VDSn−VDSn,sat)]
VTn = VT0n + γ(√(2|φF|+VSBn) − √(2|φF|))
γ = √(2q·εSi·Na)/Cox
|φF| = (kT/q)ln(Na/ni)
pFET (mirror):
Triode: ID = (βp/2)[2(VSGp−|VTp|)VSDp − VSDp²]
Sat: ID = (βp/2)(VSGp−|VTp|)²
VSDp,sat = VSGp−|VTp|
| Region | Condition | ID |
| Cutoff | VGS<VT | 0 |
| Triode | VDS<VGS−VT | k'(W/L)[(VGS−VT)VDS−VDS²/2] |
| Sat | VDS≥VGS−VT | ½k'(W/L)(VGS−VT)² |
5 · Scaling Theory (factor S)
| Param | Full (const-field) | Const-Voltage |
| L,W,tox,Xj | ÷S | ÷S |
| VDD, VT0 | ÷S | unchanged |
| NA,ND | ×S | ×S² |
| Cox | ×S | ×S |
| ID | ÷S | ×S |
| PD (device) | ÷S² | ×S |
| PD/Area | unchanged | ×S³ |
Trap: Rn = 1/[βn(VDD−VTn)] is UNCHANGED under full scaling
(β↑S cancels (VDD−VT)↓S)
6 · FET RC Model & Elmore Delay
Rn = η/[βn(VDD−VTn)] → η=1: Rn = 1/[βn(VDD−VTn)]
Rp = 1/[βp(VDD−|VTp|)]
CG = Cox·W·L′
CGS ≈ CGD ≈ CG/2
C = C0/(1+VR/φ0)^mj , C0=Cj·Apn
φ0 = (kT/q)ln(NaNd/ni²) , mj=½ (abrupt) or ⅓ (graded)
Cbottom = Cj·X·W
Csidewall = Cjsw·Psw , Psw = 2(W+X)
Cn = Cbottom + Csidewall
CS = CGS+CSB , CD = CGD+CDB
Elmore (ladder): TD = R1C1+(R1+R2)C2+(R1+R2+R3)C3+...Each Ci weighted by ALL upstream R.
Constants
ε0 = 8.854×10⁻¹⁴ F/cm = 8.854×10⁻¹² F/m
εSi ≈ 11.8ε0 , εox = 3.9ε0
ni = 1.45×10¹⁰ cm⁻³ , kT/q ≈ 0.026 V (300K)
mobility ratio r = μn/μp ≈ 2–3